Status : Published

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Abstract

This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.

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General information

  • Status
     : Published
    Publication date
     : 2020-08
    Stage
    : International Standard published [60.60]
  • Edition
     : 1
    Number of pages
     : 29
  • Technical Committee :
    ISO/TC 206
    ICS :
    81.060.30 
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Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

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